SPTS Delta provides high-quality deposition of SiO2 and SiNx, with excellent thickness uniformity across wafers up to 200 mm (8 inch) and stable process performance.
Users can tune key film properties, including refractive index, stress, and stoichiometry. Ammonia-free nitride recipes are also available, which can help reduce film stress, improve optical properties, and fine-tune film stoichiometry.
Important: Do not use any paste, grease, oil, or other adhesive materials to secure samples to the wafer carriers. These materials can outgas during processing and contaminate the chamber.
The wafer size should be 8". Please use the recessed wafer carriers, which are available for different wafer sizes if your sample is not 8"wafer size.
After completing your deposition, record the following information in the logbook located next to the tool:
Recipe name
Substrate material(s)
Process time
Deposition type (SiO2 or SiNx)
Any relevant process parameters or observations
Your name and date of use
Accurate logbook records are essential for process traceability, troubleshooting, and chamber maintenance.
Responsible: Amirreza Ghassami, Max Bäckström
Location: Q258: Aixtron CCS
License and Booking Required: Yes