Technical information
Simple microwave oxygen plasma ashing system. Purpose: removal of organic contamination (e.g. resists etc) from the surface, oxidation in oxygen plasma. Standard process pressure 5mbar. Gases O2 and N2 installed. Location: room Q158, NANO-process lab.
Tool Overview
Responsible: Amirreza Ghassami
Location: Q158: EVA lab
License and Booking Required: No
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