Resists and Developers | Lund Nano Lab

This area is still under construction and may change frequently.

Some information and links may still be missing.

Wet Benches

Any work with resists and developers should be performed at a solvent dedicated wet bench.

Staff Contacts Chemical Responsible: Natalia Volkova Lithography Engineer: Lithography Engineer: Anders Kvennefors	Documentation MSDS Risk Assessments Policies regarding lab supplied resists
LNL Supplies Chemicals and storage location: List of LNL supplied Resists List of LNL supplied Developers Staff Documents	Process Recipes and troubleshooting Process - Resist coating Baseline spin curves MicroChemicals: Storage and Handling information

General Rules with working with resists

Room Temperature Handling only - Do not take or use resist from a refrigerated resist supply! Contact Chemical responsible for a new filled bottle when necessary. Old bottles should not be refilled since old, compromised resist will remain and risk particles and flakes of resist in the future.
Moisture from the air can condense into the main resist supply when it is cold. Refrigerated bottles need to warm completely to room temperature before opening or this can lead to resist degradation. Small bubbles form in the resist and agglomerate over time.
Limit exposure to air and handling methods - Minimize the time resist bottles are open and the filled pipettes sit in the holder.
Do not pour resist directly from bottles, extract only with pipettes. Pouring can lead to resist drying around the top of the bottle and flakes of resist falling into the main supply. (exceptions for extremely viscous resists are necessary e.g SU8)
Blow out pipettes with N2 gun before dipping in resist to minimize particles contaminating main supply. Expel air from pipette before lowering into resist.
Do not double dip pipette into bottle.