Technical information
UV-lithography system.
Location: room Q161, Nano-process lab.
Soft UV contact mask aligner, with LED light source.
Wavelengths available: 365nm, 405nm and 432nm.
For exposure of small pieces, and 1", 2", 3" and 4" wafers. Mask sizes 3.5", 4" and 5".
Tool Overview
Responsible: Harald Havir
Location: Q161: UVL lab
License and Booking Required: Yes
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