Technical information
Nanoimprint lithography system from Obducat, samples up to 6". Combined thermal and/or UV-imprint. Max temperature 200°C, max pressure 60bar. Location: room Q237, YR-room, Berzeilius lab.
Tool Overview
Responsible: David Alcer, Anders Kvennefors
Location: Q237: YR lab
License and Booking Required: Yes
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