Technical information
- Non-contact direct write lithography.
- Exposure of small pieces and full wafers.
- 6" max wafers or 5" masks
- Lasers: wavelength = 375nm, 405nm.
- 0.8um resolution limit and 500nm alignment accuracy
Tool Overview
Responsible: Jason Beech, Harald Havir
Location: Q161: UVL lab
License and Booking Required: Yes
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