Technical information
The tool is located in the Aerosol room (Q246) in the Berzelius lab. The tool has 4 precursor positions, currently with: 1. Zirconium (TEMAZr, Pico Booster). 2. Hafnium (TDMAHf, Pico Booster). 3. Water. 4. Aluminum (TMA). The tool is intended for deposition of thin layers of high-k oxides, where oxide/interface purity and quality is a concern. Wafer/sample loading/unloading is done in nitrogen ambient in a glovebox.
Maximum wafer/sample size: 4-inch (100 mm).
Tool Overview
Responsible: Harald Havir, André Andersen
Location: Q246: Cluster tool
License and Booking Required: Yes
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