Technical information
Atomic Layer Deposition system from Cambridge Nanotech. Deposition of AlOx and HfO high-k dielectric. Installed in room Q255
Available Precursors: TMAl, TDMAHf, TTBSi, DEZn
Tool Overview
Responsible: Harald Havir, Anders Kvennefors
Location: Q255: LEO SEM
License and Booking Required: Yes
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