Technical information
The tool has successfully passed acceptance tests and is ready for processing. It offers high-quality deposition of SiO2 and SiNx with excellent thickness uniformity over 200 mm wafer size and stable performance. Users can tune key film properties such as refractive index, stress, and stoichiometry. There is also the option to run ammonia-free nitride recipes, which can help reduce film stress, improve optical characteristics, and fine-tune stoichiometry.
We also have access to a large library of qualified SPTS recipes, which will support a wide range of process needs.
Tool Overview
Responsible: Amirreza Ghassami, Max Bäckström
Location: Q258: Aixtron CCS
License and Booking Required: Yes
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