Technical information
Thermal evaporation system for Au, Al, Ni, NiCr, FeNi, Pd, Zn, Ti, Ge, and for Cr and SiO sublimation. Substrates up to 2", Tilting and rotation of the sabstrate is possible. Base pressure below 7*10-7mbar. Location: room Q158, NANO-process lab.
Tool Overview
Responsible: Max Bäckström, Johan Stjernholm
Location: Q158: EVA lab
License and Booking Required: Yes
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