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titleTool Overview

Responsible: Amirreza Ghassami 

Location: Room Q258, Nano-epitaxy (Cleanroom Level 2)

License and Booking Required: Yes

Main application: Hard mask for device fabrication and a high-k (high-dielectric-constant) material for electronic and photonics applications

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titleTechnical information
  • Plasma Enhanced CVD system (PECVD)
  • Deposition of SiO2, Si3N4 and a-Si
  • HF (13.56 MHz) power: 0-1600 W
  • LF (375 kHz) power: 0- 500W
  • Temperatures: 120 to 300°C
  • Gases available: H2, SiH4, NH3, N2, O2, C4F8, N2O
  • Maximum wafer size: 8"





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titleDocumentation

User manuals

Staff Documents

Process

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titleOther Links

Safety Information

View on LIMS

FAQ

User Discussion Forum

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